| 发明名称 |
Hybrid compound, resist, and patterning process |
| 摘要 |
A phenolic resin/silicone resin hybrid compound is obtained by effecting hydrolytic condensation of an organooxysilane in the co-presence of a phenolic resin. The hybrid compound is used as the base polymer in a resist for endowing a resist film with excellent adhesion to a metal substrate.
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| 申请公布号 |
US2003096191(A1) |
申请公布日期 |
2003.05.22 |
| 申请号 |
US20020268761 |
申请日期 |
2002.10.11 |
| 申请人 |
KATO HIDETO;FURIHATA TOMOYOSHI |
发明人 |
KATO HIDETO;FURIHATA TOMOYOSHI |
| 分类号 |
C08G8/28;C08L61/04;C08L83/04;G03F7/023;G03F7/075;H01L21/027;(IPC1-7):G03C1/73;G03C1/74;G03C1/76;G03C1/77;G03F7/20;G03F7/30 |
主分类号 |
C08G8/28 |
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