发明名称 INSPECTION DEVICE AND INSPECTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide an inspection device and inspection method capable of inspecting whether or not ions are injected to a desired position in an ion injection process by use of a stencil mask. SOLUTION: This inspection device and method includes an excited light irradiation means 2 for irradiating a body to be inspected with an excited light capable of expanding the ion injecting position of the body to be inspected; inspecting light emitting means 3, 4, and 5 for generating inspecting light and reference light differed in frequency and emitting the inspecting light onto the body to be inspected irradiated with the excited light so as to be scannable; light receiving means 7 and 8 for receiving the overlapped light of the reflected light from the body to be inspected of the inspecting light with the reference light, and detecting the light intensity of the overlapped light; and a detecting means 20 for generating a contrast waveform in the scanning direction of the inspecting light on the basis of the light intensity detected by the light receiving means, and detecting the ion injecting position of the body to be inspected on the basis of the contrast waveform.
申请公布号 JP2003148911(A) 申请公布日期 2003.05.21
申请号 JP20010343914 申请日期 2001.11.08
申请人 SONY CORP 发明人 OKAWACHI HIROKI
分类号 G01B11/00;H01L21/66;(IPC1-7):G01B11/00 主分类号 G01B11/00
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