| 摘要 |
A chemically amplified resist including base resin represented by a general formula [1], a radiation-sensitive acid generator; polystyrene acting as a filler and a solvent dissolving the resin, the acid generator and the filler; wherein a content of the resin is between 10 and 20% in weight with respect to the entire chemically amplified resist, contents of the acid generator and the filler are between 1 and 15% in weight and between 0.5 and 6.0% in weight, respectively, with respect to the resin, and a balance is the solvent. The chemically amplified resist having the excellent controllability with respect to dimensions and shapes can be obtained because a free volume of the chemically amplified resist is reduced by filling a free volume in the chemically amplified resist with the filler:
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