| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating method and a coating apparatus in which a coating film such as a resist film is formed with high film thickness precision and film thickness uniformity. SOLUTION: The coating apparatus is equipped with a substrate holding member 51 for holding a substrate W to be processed nearly horizontal, a motor 52 for rotating the substrate holding member 51, a coating liquid discharge nozzle 90 for supplying a coating liquid to the center of the substrate W to be processed, a pump 97 for discharging the coating liquid from the nozzle 90, a valve 94 provided in the pipe line 91, a valve opening detection means 94a for detecting a signal showing that the valve 94 is opened and a control means 100 for starting to drive the motor 52 based on the detection signal inputted to the valve opening detection means 94a. |
