| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning method and an cleaning apparatus by which a load in waste water treatment equipment is reduced, and to provide a method for manufacturing an electrooptical device using such a cleaning method, an electrooptical device and an electronic instrument. SOLUTION: The cleaning apparatus 501 is provided with cleaning tanks 510, 520 and 530 to clean a product in process in manufacturing a liquid crystal device as a work W, a rough-rinsing tank 560 for roughly rinsing the work W, and finish-rinsing tanks 570, 580 and 590 for finish-rinsing the work W. The cleaning apparatus 501 is further provided with a shower bath 540 which sprays pure water to the work W and carries out a shower rinsing process before moving the work W taken out from the rough-rinsing tank 560 to the finish-rinsing tank 570. The load of the waste water treatment equipment 620 is reduced because water used for rough-rinsing is not introduced into the finish- rinsing tank 570.
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