发明名称 Semiconductor device with trench gate having structure to promote conductivity modulation
摘要 An IGBT has a p-emitter layer and p-base layer, which are arranged on both sides of an n-base layer. A pair of main trenches are formed to extend through the p-base layer and reach the n-base layer. In a current path region interposed between the main trenches, a pair of n-emitter layers are formed on the surface of the p-base layer. A narrowing trench is formed to extend through the p-base layer and reach the n-base layer. The narrowing trench narrows a hole flow path formed from the n-base layer to the emitter electrode through the p-base layer, thereby increasing the hole current resistance.
申请公布号 US6566691(B1) 申请公布日期 2003.05.20
申请号 US20000672963 申请日期 2000.09.29
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 INOUE TOMOKI;SUGIYAMA KOICHI;NINOMIYA HIDEAKI;OGURA TSUNEO
分类号 H01L21/331;H01L29/739;(IPC1-7):H01L29/78 主分类号 H01L21/331
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