发明名称 SUBSTRATE-RETAINING APPARATUS AND SUBSTRATE-CONVEYING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate-retaining apparatus that can retain and release a substrate with a simple structure even in a state where the substrate is inclined. SOLUTION: A conveyance arm 510 has two fixed type retention members 520 and one rotation type retention member 530. At the lower section of the conveyance arm 510, a permanent magnet 560 that can be moved by an actuator 570 is arranged. A support section 531 of the rotation type retention member 530 is rotatably mounted to the conveyance arm 510 with the center axis as a rotary axis, and a retention section 532 is fixed to the upper surface section of the support section 531 while the retention section 523 is eccentric relative to the rotary axis of the support section 531. In addition, a permanent magnet 550 is interlocked to the rotation type retention member 530. The permanent magnet 560 is brought closer to or separated from the conveyance arm 510 by the actuator 570, thus rotating the rotation type retention member 530, and positioning a substrate W by the retention section 532 for retaining and releasing.
申请公布号 JP2003142554(A) 申请公布日期 2003.05.16
申请号 JP20020301681 申请日期 2002.10.16
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 IKEDA MASAHIDE;OTANI MASAMI
分类号 B25J15/08;B65G49/06;B65G49/07;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B25J15/08
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