发明名称 Ceramic substrate for manufacture/inspection of semiconductor
摘要 It is an object of the present invention to provide a ceramic substrate for a semiconductor producing/examining device which has high fracture toughness value, excellent thermal shock resistivity, high thermal conductivity and an excellent temperature rising and falling properties, and is preferable as a hot plate, an electrostatic chuck, a wafer prober and the like. A ceramic substrate, for a semiconductor producing/examining device, having a conductor formed inside thereof or on the surface thereof of the present invention is the ceramic substrate, wherein said ceramic substrate has been sintered such that a fractured section thereof exhibits intergranular fracture.
申请公布号 US2003089975(A1) 申请公布日期 2003.05.15
申请号 US20020926464 申请日期 2002.01.10
申请人 HIRAMATSU YASUJI;ITO YASUTAKA;OZAKI ATSUSHI 发明人 HIRAMATSU YASUJI;ITO YASUTAKA;OZAKI ATSUSHI
分类号 C04B35/581;C04B35/64;H01L23/15;(IPC1-7):H01L23/053;H01L29/40;H01L23/34 主分类号 C04B35/581
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