| 摘要 |
<p>The present invention relates to methods of predicting proximity heating of resists in electron beam lithography in real-time as the writing proceeds enabling beam compensation in current and/or dwell time to be performed during writing. A method of using a precomputed kernel capable of proximity resist temperature evaluation in real-time as beam writing proceeds by scalar product of the hernel with a graded cell size coverage map. A shifted impulse response function is shown to give the kernel values accurate to within a few percent.</p> |
