发明名称 |
ALKYLSULFONYLOXIME FÜR I-LINE-PHOTORESISTS HOHER AUFLÖSUNG UND EMPFINDLICHKEIT |
摘要 |
<p>The invention describes the use of oxime alkyl sulfonate compounds of formula (1), wherein R is naphthyl, (2) or (3); R0 is either an R1-X group or R2; X is a direct bond, an oxygen atom or a sulfur atom; R1 is hydrogen, C1-C4alkyl or a phenyl group which is unsubstituted or substituted by a substituent selected from the group consisting of chloro, bromo, C1-C4alkyl and C1-C4-alkyloxy; R2 is hydrogen or C1-C4alkyl; and R3 is straight-chain or branched C1-C12alkyl which is unsubstituted or substituted by one or more than one halogen atom; as photosentisitve acid generator in a chemically amplified photoresist which is developable in alkaline medium and which is sensitive to radiation at a wavelength of 340 to 390 nanometers and correspondingly composed positive and negative photoresists for the above-mentioned wavelength range.</p> |
申请公布号 |
AT237830(T) |
申请公布日期 |
2003.05.15 |
申请号 |
AT19970942870T |
申请日期 |
1997.08.22 |
申请人 |
CIBA SPECIALTY CHEMICALS HOLDING INC. |
发明人 |
DIETLIKER, KURT;KUNZ, MARTIN;YAMATO, HITOSHI;DE LEO, CHRISTOPH |
分类号 |
C07C309/65;C07C309/66;C07D333/22;C07D333/24;G02B5/20;G03F7/00;G03F7/004;G03F7/038;G03F7/039;G03H1/02;H01L21/027;(IPC1-7):G03F7/004 |
主分类号 |
C07C309/65 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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