发明名称 |
PEN WITH WRITING PRESSURE ADJUSTING MECHANISM FOR ENGRAVING LETTER ON WAFER |
摘要 |
PROBLEM TO BE SOLVED: To provide a pen for engraving letters on a wafer by which fluctuation of writing pressure of an operator is absorbed to perform uniform engraving of the letters and when an excessive writing pressure is applied on a pen point, the wafer is prevented from being broken. SOLUTION: In the pen 31 for engraving letters on the wafer, a spring 37 and spring receivers 38a and 38b are stored in a joint part 33 and a spring 39 and spring receivers 40a and 40b are stored in a cap 34. The spring 37 is for adjusting the writing pressure applied on a pen point 36 and the spring 39 is for storing the pen point 36 in the cap 34 when the excessive writing pressure is applied on the pen point 36.
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申请公布号 |
JP2003136886(A) |
申请公布日期 |
2003.05.14 |
申请号 |
JP20010334264 |
申请日期 |
2001.10.31 |
申请人 |
NEC KANSAI LTD |
发明人 |
SHIRAKAWA YASUHIRO;OHATA NORIYUKI;IMAMURA TAKAFUMI;MASUDA MITSUTAKA |
分类号 |
B43K19/00;H01L21/02;(IPC1-7):B43K19/00 |
主分类号 |
B43K19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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