发明名称 PHOTOCURABLE/THERMOSETTING RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM FORMED THEREFROM, AND METHOD OF FORMING PATTERN WITH THE SAME
摘要 A photocurable and thermosetting resin composition comprising (A) a photosensitive prepolymer having a carboxyl group in combination with at least two ethylenically unsaturated double bonds in its molecule, (B) a polymerization initiator, (C) a diluent, (D) an oxetane compound having at least two oxetanyl groups in its molecule, and (E) a curing promotor is developable with an alkaline solution and can be formulated as a one package preparation. Such a photocurable and thermosetting resin composition and a photosensitive dry film prepared by the use thereof are useful as various resist materials and electrical insulating materials, particularly as solder resists for printed circuit boards, interlaminar insulating materials for build-up multi-layer printed circuit boards, and the like.
申请公布号 EP1276011(A4) 申请公布日期 2003.05.14
申请号 EP20010917564 申请日期 2001.03.28
申请人 KANAGAWA UNIVERSITY;TAIYO INK MANUFACTURING CO. LTD 发明人 ONODERA, SEIYA DI;NISHIKUBO, TADATOMI;KAMEYAMA, ATSUSHI;SASAKI, MASAKI;KUSAMA, MASATOSHI
分类号 C08F2/48;C08G65/18;G03F7/004;G03F7/038;H05K3/28;H05K3/46 主分类号 C08F2/48
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