发明名称 POSITIVE PHOTOSENSITIVE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a positive photosensitive composition excellent in edge roughness and producing no scum. SOLUTION: The positive photosensitive composition is characterized in containing (A) a specified sulfonium salt compound which generates an acid by irradiation of active rays or radiation and (B) a resin which has a monocyclic or polycyclic alicyclic hydrocarbon structure and which is decomposed by the effect of an acid to increase the solubility in an alkali developing solution.
申请公布号 JP2003140344(A) 申请公布日期 2003.05.14
申请号 JP20010337884 申请日期 2001.11.02
申请人 FUJI PHOTO FILM CO LTD 发明人 KODAMA KUNIHIKO
分类号 G03F7/039;G03F7/004;H01L21/027 主分类号 G03F7/039
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