发明名称 Exposure apparatus and semiconductor device manufacturing method using the apparatus
摘要 Disclosed is a method of performing assay to a fluorite sample, which includes a first step for dissolving a fluorite sample, containing Ca and F, by use of a solvent, a second step for removing Ca and F from an obtained solution, and a third step for assaying, through ICP-MS, the solution having Ca and F removed therefrom. Also disclosed is a method of producing a fluorite crystal and an exposure apparatus using such fluorite crystal, and a device manufacturing method using such exposure apparatus. The assaying method of the present invention ensures assay and evaluation of a fluorite sample, of sensitivity several times higher than conventional methods. <IMAGE>
申请公布号 EP1310458(A2) 申请公布日期 2003.05.14
申请号 EP20020254694 申请日期 2002.07.04
申请人 CANON KABUSHIKI KAISHA 发明人 OOKUBO, KENJI
分类号 C30B11/00;G01N27/62;C30B29/12;G01N1/28;G01N21/73;G02B1/02;G03F7/20 主分类号 C30B11/00
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