METHOD FOR ESTIMATING PARTICLE COUNTING EFFICIENCY USING SEM

摘要

PURPOSE: A method for estimating particle counting efficiency using an SEM(Scanning Electron Microscopy) apparatus is provided to be capable of finding the particle counting error of a WSS(Wafer Surface Scanner) by comparing the counting result of the WSS with that of the SEM apparatus. CONSTITUTION: Particles are deposited on a semiconductor wafer as much as the predetermined number(301). The deposited particles of the semiconductor wafer are designated to the coordinates system, respectively(302). After loading the semiconductor wafer in an SEM(Scanning Electron Microscopy) apparatus, the number of the particles of the semiconductor wafer is checked by using electron beam(303). Then, the semiconductor wafer is loaded in a WSS(Wafer Surface Scanner)(304). The particle counting efficiency is estimated by comparing the number of the particles checked by the WSS with that checked by the SEM apparatus(305).