| 发明名称 |
ANTIREFLECTIVE COATING COMPOSITIONS |
| 摘要 |
<p>The present invention provides new light absorbing compositions suitable for use as an antireflective coating ("ARC") with an overcoated resist layer. ARCs of the invention exhibit increased etch rates in standard plasma etchants. Preferred ARCs of invention have significantly increased oxygen content relative to prior compositions.</p> |
| 申请公布号 |
EP1309898(A2) |
申请公布日期 |
2003.05.14 |
| 申请号 |
EP20010964117 |
申请日期 |
2001.08.17 |
| 申请人 |
SHIPLEY COMPANY LLC |
发明人 |
MAO, ZHIBIAO;COLEY, SUZANNE;ADAMS, TIMOTHY, G. |
| 分类号 |
G03F7/11;G03F7/004;G03F7/033;G03F7/09;H01L21/027;(IPC1-7):G03F7/09 |
主分类号 |
G03F7/11 |
| 代理机构 |
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