| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate washing nozzle capable of reliably washing the back surface of a substrate. SOLUTION: The substrate washing nozzle for spraying an inert gas and a treatment liquid on the back surface of a spinning substrate has an inert gas spraying means in the center thereof, and a plurality of washing liquid spraying means having different tilt angles around the inert gas spraying means. Preferably, the tilt angles of two washing liquid spraying means placed in close vicinity of the inert gas spraying means, among the plurality of washing liquid spraying means, are each equal to the tilt angle of the inert gas spraying means. The spraying means are preferably composed of holes. The substrate washing nozzle preferably has the upper face composed of a curved surface having a plurality of curvature radii.
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