发明名称 |
Reactive agent and process for decomposing fluorine compounds and use thereof |
摘要 |
A reactive agent for decomposing fluorine compounds comprising alumina and an alkaline earth metal compound; a process for decomposing fluorine compounds, comprising contacting the reactive agent with a fluorine compound at a temperature of 200° C. or more; and a process for manufacturing a semiconductor device, comprising an etching or cleaning and a decomposing using the reactive agent.
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申请公布号 |
US6563011(B2) |
申请公布日期 |
2003.05.13 |
申请号 |
US20010956796 |
申请日期 |
2001.09.21 |
申请人 |
SHOWA DENKO KABUSHIKI KAISHA |
发明人 |
ATOBE HITOSHI;KANEKO TORAICHI;HAYASAKA YUJI;YANO SHINICHI |
分类号 |
A62D3/00;A62D3/30;A62D3/34;A62D3/36;A62D3/38;A62D101/22;B01D53/70;(IPC1-7):A62D3/00 |
主分类号 |
A62D3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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