发明名称 |
Method of operating an optical imaging system, lithographic projection apparatus, device manufacturing method, and device manufactured thereby |
摘要 |
The present invention provides a method of operating a lithographic projection apparatus including calculating a change in aberration effect in the projection system, due to heating effects, as a function of time, based on at least one set of predetermined parameters; and adjusting the lithographic projection apparatus to compensate for the calculated change in aberration effect. The parameters are obtained by a calibration operation, which may comprise a coarse calibration followed by at least one fine calibration. The coarse calibration yields a first estimate of at least a subset of the parameters. The estimate can be used as an input for a subsequent fine calibration. The calibration may also comprise a single fine calibration.
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申请公布号 |
US6563564(B2) |
申请公布日期 |
2003.05.13 |
申请号 |
US20010878182 |
申请日期 |
2001.06.12 |
申请人 |
ASM LITHOGRAPHY B.V. |
发明人 |
DE MOL CHRISTIANUS GERARDUS MARIA;CASTENMILLER THOMAS JOSEPHUS MARIA;VAN DIJK MARCEL;COMMISSARIS FRANCISCUS ANTONIUS CHRYSOGONUS MARIE;DE GROOT SIMON;VAN DEN ENDEN CATHARINA JOHANNA LUCIA MARIA |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):G03B27/52 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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