| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas laser apparatus that can obtain nearly the same pulse energy from a low-frequency band to a high-frequency one. SOLUTION: The gas laser apparatus is equipped with a laser chamber (12) for encapsulating a laser gas containing xenon, main electrodes (14 and 15) for stimulating the laser gas by main discharge to oscillate a laser beam (21), a heat exchanger (13) for cooling the laser gas, and a laser controller (29). In the laser controller (29), a flushing process is carried out. The flushing process includes a heating process for heating at least one portion of a site inside the laser chamber (12) that comes into contact with the laser gas, and a process for discharging the inside of the laser chamber after the heating process. |
