| 摘要 |
PROBLEM TO BE SOLVED: To provide a new negative photosensitive resin composition developable with a dilute alkali solution and having good resolution, excellent etching resistance and such good removability that it is dissolved in an aqueous alkali solution. SOLUTION: The photosensitive resin composition comprises (A) an alkali- soluble copolymer having a terminal ethylenically unsaturated group and a carboxyl group in a side chain, (B) one or more of the photopolymerizable compounds of formula (1) having at least one polymerizable ethylenically unsaturated group in one molecule and (C) a photopolymerization initiator. In the formula (1), R1 is H or methyl; m is 0, 1 or 2; and R2 is alkylene. |
