发明名称 NON-CONTACTING DEPOSITION CONTROL OF CHALCOPYRITE THIN FILMS
摘要 <p>A method and apparatus of depositing chalcopyrite semiconductor thin films with CVD or sputter deposition chamber (3); sources (6) connected through links (8) to the control feedback (12), and processor (11) is further connected to spectroscopy system (10) that provides a quality function using reflected light from the substrate for adjustment of the deposition constituents.</p>
申请公布号 WO2003038871(A1) 申请公布日期 2003.05.08
申请号 US2002031573 申请日期 2002.10.15
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