发明名称 |
Manufacturing method for electron-emitting device, electron source, and image-forming apparatus |
摘要 |
A method for manufacturing an electron-emitting device processing an electroconductive film upon which an electron-emission region is formed is characterized in that the formation process of formation of the electron-emission region includes a process of application of metal compound-containing material and film thickness controlling agent to the substrate. A method for manufacturing an electron source comprises a substrate, and a plurality of electron-emitting devices arrayed upon the substrate, wherein the electron-emitting devices are manufactured according to the method for manufacturing the electron-emitting device. A method for manufacturing an image-forming apparatus comprises a substrate, an electron source comprised of a plurality of electron-emitting devices arrayed upon the substrate, and an image-forming member, wherein the electron-emitting devices are manufactured according to the method for manufacturing an electron-emitting device.
|
申请公布号 |
US2003087036(A1) |
申请公布日期 |
2003.05.08 |
申请号 |
US20020236935 |
申请日期 |
2002.09.09 |
申请人 |
TAKAHASHI YASUO;MIURA NAOKO |
发明人 |
TAKAHASHI YASUO;MIURA NAOKO |
分类号 |
H01J9/02;(IPC1-7):B05D5/12;B05D1/36 |
主分类号 |
H01J9/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|