发明名称 Substrate supporting apparatus, substrate transfer apparatus and the transfer method, method of holding the substrate, exposure apparatus and the method of manufacturing the apparatus
摘要 A substrate supporting apparatus and a substrate holder are prepared, the substrate supporting apparatus including an opening portion having a plurality of openings smaller than the substrate and a support portion made up of portions other than the opening portion, and the substrate holder having a housing portion which houses at least a portion of the support portion. The substrate supporting apparatus supporting the substrate is mounted on the holder in a state where at least a portion of the support portion is housed in the housing portion. Accordingly, the substrate and the substrate supporting apparatus are integrally supported by the holder in a state where the substrate directly contacts an upper surface of the holder.
申请公布号 US6559928(B1) 申请公布日期 2003.05.06
申请号 US20000635256 申请日期 2000.08.09
申请人 NIKON CORPORATION 发明人 AOKI YASUO
分类号 G03F7/20;(IPC1-7):G03B27/58;G03B27/42;G03B27/32 主分类号 G03F7/20
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