发明名称 Scan-exposure device
摘要 A scan-exposure device is provided wherein light beams becoming out of focus due to temperature changes is prevented and focus adjustment can be easily carried out, when a recording medium is subjected to scan-exposure by a plurality of light sources. A stage of an exposing head having a plurality of light source units provided thereon is supported by bases disposed at longitudinal direction opposite end portions thereof, and bases move in a sub-scanning direction which is the longitudinal direction of the stage when driven by a sub-scanning motor. The bases move relatively, in proportion to expansion or contraction of the stage, thereby preventing deformation of the stage due to temperature changes so that dislocation does not occur and light beams emitted from the light source units do not become out of focus due to deformation of the stage.
申请公布号 US6559880(B2) 申请公布日期 2003.05.06
申请号 US20010813979 申请日期 2001.03.22
申请人 FUJI PHOTO FILM CO., LTD. 发明人 OHBA MASAHIRO
分类号 G02B26/10;B41C1/10;B41J2/475;G03F7/20;G03F7/24;H04N1/113;(IPC1-7):B41J2/435 主分类号 G02B26/10
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