发明名称 Semiconductor device and method of manufacturing the same
摘要 There is provided a semiconductor device using a TFT structure of high reliability.A gate electrode of a TFT includes a first conductive layer, a second conductive layer, and a third conductive layer. An LDD region has a part which overlaps the gate electrode via a gate insulating film and a part which does not overlap the gate electrode. As a result, this can prevent the deterioration when the TFT is on and can reduce a leakage current when the TFT is off.
申请公布号 US6558993(B2) 申请公布日期 2003.05.06
申请号 US20010860184 申请日期 2001.05.17
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD.;SHARP KABUSHIKI KAISHA 发明人 OHTANI HISASHI;YAMAZAKI SHUNPEI;ITOH MASATAKA
分类号 G02F1/1362;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L29/49;H01L29/786;(IPC1-7):H01L21/00 主分类号 G02F1/1362
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