发明名称 |
Method and apparatus for monitoring controller performance using statistical process control |
摘要 |
The present invention provides for a method and an apparatus for monitoring controller performance using statistical process control analysis. A manufacturing model is defined. A processing run of semiconductor devices is performed as defined by the manufacturing model and implemented by a process controller. A fault detection analysis is performed on the process controller. At least one control input signal generated by the process controller is updated. The apparatus of the present invention comprises: a processing controller; a processing tool coupled with the processing controller; a metrology tool interfaced with the processing tool; a control modification data calculation unit interfaced with the metrology and connected to the processing controller in a feedback manner; a predictor function interfaced with the processing controller; an statistical process control analysis unit interfaced with the predictor function and the processing tool; and a results versus prediction analysis unit interfaced with the statistical process control analysis unit and connected to the processing controller in a feedback manner.
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申请公布号 |
US6560503(B1) |
申请公布日期 |
2003.05.06 |
申请号 |
US19990412679 |
申请日期 |
1999.10.05 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
TOPRAC ANTHONY J.;CAMPBELL WILLIAM J. |
分类号 |
G05B13/04;G05B19/418;H01L21/027;(IPC1-7):G06F19/00;G05B13/02 |
主分类号 |
G05B13/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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