发明名称 |
Alignment method, alignment apparatus, profiler, exposure apparatus, exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor manufacturing factory |
摘要 |
An alignment method includes the steps of (i) in order to expose a pattern of a first object onto a second object, measuring positions of a plurality of marks on the second object with a mark detection device and aligning the first and second objects with each other, and (ii) measuring shapes of the plurality of marks on the second object, thereby obtaining offsets that should be reflected in the measured values of the mark detection device. The shapes of the plurality of the marks are measured with a shape measurement device with no possibility of coming into contact with the mark, through calibration with reference to a shape measurement device with a possibility of coming into contact with the mark.
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申请公布号 |
US6559924(B2) |
申请公布日期 |
2003.05.06 |
申请号 |
US20010866604 |
申请日期 |
2001.05.30 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
INA HIDEKI;SENTOKU KOICHI;MATSUMOTO TAKAHIRO |
分类号 |
G01B11/24;G03F9/00;H01L21/027;(IPC1-7):G03B27/42;G03B27/54;G01B11/00 |
主分类号 |
G01B11/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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