发明名称 Semiconductor device for precise measurement of a forward voltage effect
摘要 A semiconductor device such as an IGBT, for realizing measurement precision for forward voltage effect characteristics using a relatively small current. It includes a second conductivity type of first anode region formed to partially constitute the upper surface of a first conductivity type of semiconductor substrate and having an anode electrode formed on its upper surface, a second anode region formed within said first anode region, and an anode electrode formed on said second anode region. The second anode region is electrically isolated from the first anode region, and the anode electrode formed on the upper surface of the second anode region is independent of the anode electrode formed on the upper surface of the first anode region. In such semiconductor device having said second anode region, even though a small force current, measurement can be performed at a current density which is equal to or close to a rated current.
申请公布号 US6559481(B2) 申请公布日期 2003.05.06
申请号 US20020075393 申请日期 2002.02.15
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 MATSUO KAZUSHIGE;SUEKAWA EISUKE;MOCHIZUKI KOUICHI
分类号 H01L21/329;H01L21/336;H01L29/78;H01L29/861;(IPC1-7):H01L29/74;H01L29/167 主分类号 H01L21/329
代理机构 代理人
主权项
地址