发明名称 |
A method of forming a silicon dioxide layer on a curved Si surface |
摘要 |
The present invention refers to a method of forming a silicon dioxide layer by thermally oxidizing at least one monocrystalline silicon surface region on a semiconductor substrate, said silicon surface region having a curved surface. The present invention is advantageously applicable for the formation of the collar region in the upper part of the trench of a DRAM (Dynamic Random Acess Memory) cell. The method comprises the steps of providing a semiconductor substrate (1) having at least one monocrystalline silicon surface region having a curved surface, roughening the surface of said at least one monocrystalline silicon surface region so as to produce a layer of porous silicon, and thermally oxidizing (9) said at least one roughened monocrystalline silicon surface. <IMAGE> |
申请公布号 |
EP1306894(A1) |
申请公布日期 |
2003.05.02 |
申请号 |
EP20010125000 |
申请日期 |
2001.10.19 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
GOLDBACH, MATTHIAS, DR.;SPERL, IRENE;BIRNER, ALBERT, DR. |
分类号 |
H01L21/3063;H01L21/316;H01L21/8242;H01L27/108 |
主分类号 |
H01L21/3063 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|