发明名称 METHOD FOR RECYCLING NOTCH-SHAPED WAFER FOR FLAT-SHAPED WAFER
摘要 PURPOSE: A method for recycling a notch-shaped wafer for a flat-shaped wafer is provided to increase utilization rate of wafers by transforming a notch-shaped wafer into a flat-shaped wafer. CONSTITUTION: A transversal line(14) is formed on a notch-shaped wafer(10) adjacent to a bottom end(16) of a V-shaped notch formed at the notch-shaped wafer(10) by carrying out a scribing process using an UV(Ultra-Violet) laser(12) regulated at the laser power of 1-3 watt. The notch-shaped wafer(10) is cut along the transversal line(14) using a breaker as a cutting part. The cut portion of the notch-shaped wafer(10) is polished using an edge polisher at the speed of 0.4-100 mm/sec. The notch-shaped wafer(10) is then cleaned so as to remove contaminants generated during the edge polishing process, wherein the notch-shaped wafer(10) is completely transformed into a flat-shaped wafer.
申请公布号 KR20030033665(A) 申请公布日期 2003.05.01
申请号 KR20010065747 申请日期 2001.10.24
申请人 SILTRON INC. 发明人 HONG, JIN GYUN;LEE, JAE CHUN
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
代理机构 代理人
主权项
地址