发明名称 |
METHOD FOR RECYCLING NOTCH-SHAPED WAFER FOR FLAT-SHAPED WAFER |
摘要 |
PURPOSE: A method for recycling a notch-shaped wafer for a flat-shaped wafer is provided to increase utilization rate of wafers by transforming a notch-shaped wafer into a flat-shaped wafer. CONSTITUTION: A transversal line(14) is formed on a notch-shaped wafer(10) adjacent to a bottom end(16) of a V-shaped notch formed at the notch-shaped wafer(10) by carrying out a scribing process using an UV(Ultra-Violet) laser(12) regulated at the laser power of 1-3 watt. The notch-shaped wafer(10) is cut along the transversal line(14) using a breaker as a cutting part. The cut portion of the notch-shaped wafer(10) is polished using an edge polisher at the speed of 0.4-100 mm/sec. The notch-shaped wafer(10) is then cleaned so as to remove contaminants generated during the edge polishing process, wherein the notch-shaped wafer(10) is completely transformed into a flat-shaped wafer.
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申请公布号 |
KR20030033665(A) |
申请公布日期 |
2003.05.01 |
申请号 |
KR20010065747 |
申请日期 |
2001.10.24 |
申请人 |
SILTRON INC. |
发明人 |
HONG, JIN GYUN;LEE, JAE CHUN |
分类号 |
H01L21/02;(IPC1-7):H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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