POLISHING COMPOUND, METHOD FOR PRODUCTION THEREOF AND POLISHING METHOD

摘要

A method for producing a polishing compound, which comprises dissolving a heterocyclic benzene compound such as benzotriazole in one or more organic solvents selected from the group consisting of a primary alcohol having 1 to 4 carbon atoms, a glycol having 2 to 4 carbon atoms, an ether represented by CH3CH(OH)CH2OCmH2m+1, wherein m is an integer of 1 to 4, N−methyl−2−pyrrolidone, N,N−dimethylformamide, dimethyl sulfoxide, ϝ−butyloractone and propylene carbonate, and then mixing the resulting solution with an aqueous dispersion of fine oxide particles as abrasive grains; and a polishing compound produced by the method. The use of the polishing compound for polishing a substrate having an insulating film (2) and, formed thereon, a wiring metal film (4) and a barrier film (3) allows the formation of an embedded wiring (5) being reduced in dishing, in erosion, and in scratch, with high polishing speed.