发明名称 |
Pupil filtering for a lithographic tool |
摘要 |
A mask or reticle is optimized for use in a lithographic system. The mask or reticle includes a substrate and a pupil filter pattern. The substrate includes an IC pattern representing at least one integrated circuit feature. The pupil filter pattern can enhance the resolution associated with the lithographic system.
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申请公布号 |
US6555274(B1) |
申请公布日期 |
2003.04.29 |
申请号 |
US20010775062 |
申请日期 |
2001.02.01 |
申请人 |
KYE JONGWOOK;LA FONTAINE BRUNO M. |
发明人 |
KYE JONGWOOK;LA FONTAINE BRUNO M. |
分类号 |
G03F1/14;G03F7/20;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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