POSITIVE PHOTOSENSITIVE COMPOSITION

摘要

PURPOSE: A positive photosensitive composition is provided, to obtain a positive photosensitive composition using the deep UV of 250 nm or less as an exposure light source. CONSTITUTION: The positive photosensitive composition comprises an acid generator which generates an acid upon irradiation of an actinic ray or radiation; a resin which has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution; and a basic compound. The basic compound is selected from the group consisting of a mixture of at least two kinds of basic compounds with different structures; a basic compound containing a substituted or unsubstituted aliphatic hydrocarbon group of C8 or more; and a basic compound selected from an oxygen-containing primary aliphatic amine, an oxygen-containing secondary aliphatic amine and an oxygen-containing tertiary aliphatic amine.