SYSTEM AND METHOD FOR PROCESS DEVICE SIMULATION

摘要

PURPOSE: A system and method for a process device simulation is provided to reduce a time for the whole simulation in a simulation by a process device coalescence simulator according as the number of cases of setting values of a parameter is increased. CONSTITUTION: A process simulator(20) executes a process simulation using a process, mask data with respect to one area of an area divided into two based on the center line and creates the first simulation data. A mirror inversion process unit(40) inverts the first data into line symmetry on the basis of the center line of the semiconductor device based on structure data of the semiconductor device. The mirror inversion process unit(40) connects to the first data and the mirror inversion data and creates the second data equivalent to process simulation data with respect to all areas of the semiconductor device. A device simulator(60) executes a device simulation with respect to the second data based on a predetermined interpretation condition.