发明名称 SUBSTRATE PROCESSOR
摘要 PROBLEM TO BE SOLVED: To prevent the crystallization of chemical, which becomes a problem in a chemical avoiding part arranged on the upstream side of a chemical processing part. SOLUTION: Pure water is supplied to the tank base of the chemical avoiding part 30 and it is accumulated by a prescribed level. Pure water 34 accumulated in the tank base is sequentially overflowed and is discharged outside. Chemical such as etching liquid entering the chemical avoiding part 30 on an upstream side from the chemical processing part is diluted by water accumulated in the tank base, and crystallization in the chemical avoiding part 30 is prevented even if chemical is easily crystallized.
申请公布号 JP2003124183(A) 申请公布日期 2003.04.25
申请号 JP20010320744 申请日期 2001.10.18
申请人 SUMITOMO PRECISION PROD CO LTD 发明人 HAMANO TATSUMI
分类号 B05C5/00;B05C13/02;H01L21/306;(IPC1-7):H01L21/306 主分类号 B05C5/00
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