POSITIVE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive resist composition excellent in various characteristics such as resolution and dependence on the pattern density. SOLUTION: The positive resist composition is characterized in containing (A) a compound which generates a fluorine-substituted sulfonic acid having 2 or more carbon atoms by irradiation of active rays or radiation and (B) a resin which contains a specified repeating unit and which decomposes by the effect of an acid to increase the solubility with an alkali developer liquid.