发明名称 SYSTEM AND METHOD FOR ELECTROLYTIC PLATING
摘要 The present invention includes an electrolytic plating system with an elecrolytic plating bath, means for positioning the printed circuit boards in the bath, and means to alternately generate a laminar flow of electrolyte on each side of the printed circuit boards. A preferred means to alternately generate a laminar flow of electolyte comprises a floating shield with a venturi-shaped partition and an aligned partition below the printed circuit boards, and operating a plurality of eductors below the floating shield. The means to alternately generate a laminar flow of electolyte can further comprise a transport mechanism that moves the floating shield and its partitions from side to side relative to the eductors or a mechanism to move the eductors, The plating can be also be improved by using a vibrator and a spring-mounting system that prevents vibration energy being absorbed by fixed portions of the plating system.
申请公布号 WO03033770(A2) 申请公布日期 2003.04.24
申请号 WO2002US33530 申请日期 2002.10.21
申请人 VIASYSTEMS GROUP, INC. 发明人 KEMPEN, HEIN, VAN
分类号 C25D5/02;C25D5/08;C25D7/00;C25D17/00;C25D17/06;C25D21/10;H05K3/00;H05K3/18;H05K3/42 主分类号 C25D5/02
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