发明名称 Physical vapor deposition apparatus and process
摘要 A PVD process and apparatus (120) for depositing a coating (132) from multiple sources (110,111) of different materials. The process and apparatus (120) are particularly intended to deposit a beta-nickel aluminide coating (132) containing zirconium, hafnium, yttrium and/or cerium, whose vapor pressures are sufficiently lower than NiAl to require a different evaporation rate in order to achieve higher deposition rates and better control of the coating chemistry. The PVD process and apparatus (120) entail feeding at least two materials (110,111) into a coating chamber (122) and melting the materials (110,111) at different rates to form separate molten pools (114,115) thereof. Articles (130) to be coated are suspended within the coating chamber (122), and transported with a support apparatus (118) relative to the two molten pools (114,115) so as to deposit a coating (132) with a controlled composition that is a mixture of the first and second materials (110,111).
申请公布号 US2003077403(A1) 申请公布日期 2003.04.24
申请号 US20020063808 申请日期 2002.05.15
申请人 GENERAL ELECTRIC COMPANY 发明人 DAROLIA RAMGOPAL;CORDERMAN REED ROEDER;RIGNEY JOSEPH DAVID;NARDI RICHARD ARTHUR;WEIMER MICHAEL JAMES
分类号 C23C14/16;C23C14/24;C23C14/30;(IPC1-7):C23C14/00;C23C14/28 主分类号 C23C14/16
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