| 摘要 |
A catoptric element is made from a hollow member having inner reflective surfaces that can reflect light having a wavelength shorter than 157 nm. An illumination optical system for illuminating an illumination plane includes a light source for providing a light flux, the catoptric element, which generates a plurality of images of the light source by internally reflecting the light flux from the light source, and a relay optical system for leading the light from the catoptric element to the illumination plane. A projection exposure apparatus for projecting and transferring a predetermined pattern formed on a projection original onto a substrate to be exposed via a projection optical system includes the illumination optical system, which forms the illumination plane on the projection original. The projection exposure apparatus can be used to manufacture various devices.
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