| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processor capable of accurately measuring a plasma emission in a process chamber stably for a long time, without deteriorating the transmittance of a port for measuring the plasma emission. SOLUTION: The processor for processing a sample W with plasma P generated in a process chamber 100 has a plate 115 mounted on a UHF antenna 111 positioned to face the sample, the plate 115 has a plurality of through-holes 115B crowded together, an optical transmission body 141 is disposed approximately in contact with the backsides of the through-holes 115B, an optical transmitting means 151 is disposed at the other end of the transmitter 141, and a measuring unit 151 measures optical information from the sample W and the plasma via the transmitter 141 and the transmitting means 151. Even in discharge for a long time, neither abnormal discharge nor foreign material is produced at the through-holes 115B and the optical performance of the end face of the optical transmitter 141 is not deteriorated. Hence it is possible to accurately measure the surface of the sample W and the plasma condition stably for a long time.
|
