| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem that although a conventional near-field light generation element comprising a very small scatterer can enhance a resolution and can increase the intensity of light obtained by a detector, the manufacture of the generation element requires a high-cost manufacturing apparatus, that the generation element cannot be mass-produced and that the low cost of an SNOM device or an optical memory device is difficult. SOLUTION: In the method of manufacturing the near-field light generation element, the very small scatterer used to generate a plasmon when light is irradiated is formed at the inside of an opening. The method comprises a very-small-scatterer formation process 101 in which the very small scatterer is formed on the surface of a light propagator, a very-small-scatterer mask-part formation process 102 wherein a material whose refractive index is lower than the refractive index of the light propagator is brought into contact with the light propagator and a very-small-scatterer mask part is formed by an exposure luminous flux satisfying a total reflection condition in the interface between the light propagator and the low-refractive-index material and an opening formation process 103 in which the opening is formed in such a way that the very small scatterer is arranged at the inside of the opening by using the very-small-scatter mask part.
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