发明名称 PLASMA PRODUCTION DEVICE AND METHOD AND RF DRIVER CIRCUIT
摘要 <p>An RF driver circuit and an orthogonal antenna assembly/configuration, are disclosed as part of a method and system for generating high density plasma. The antenna assembly (105, 115, 110, 120) is an orthogonal antenna system that may be driven by any RF generator/circuitry (125, 130) with suitable impedance matching to present a low impedance. The disclosed RF driver circuit uses switching type amplifier elements and presents a low output impedance. The disclosed low-output impedance RF driver circuits eliminate the need for a matching circuit for interfacing with the inherent impedance variations associated with plasma. Also disclosed is the choice for capacitance or an inductance value to provide tuning for the RF plasma source.</p>
申请公布号 WO2003032434(A1) 申请公布日期 2003.04.17
申请号 US2002032334 申请日期 2002.10.09
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