发明名称 High resistivity films for AP layers in spin valves
摘要 In a spin valve, at least one AP pinned sublayer and/or one AP free sublayer comprise high resistivity alloys of the type AB, wherein A is selected from the group consisting of CoFe, NiFe, and CoFeNi, and B is selected from the group consisting of B, Ta, Nb, Zr, and/or Hf. The resistivity value of the highly resistive layer is typically between about 30 muOMEGA-cm and 100 muOMEGA-cm. The highly resistive layers reduce the shunting of the sense current away from the rest of the structure, and prevent electrons from being shunted away from the active region of the spin valve and, thus, reducing DELTAR/R. The spin valve of this layered structure can increase the overall sheet resistance and optimize the DELTAR/R value of the spin valve.
申请公布号 US6548186(B1) 申请公布日期 2003.04.15
申请号 US20000574301 申请日期 2000.05.19
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CAREY MATTHEW JOSEPH;GURNEY BRUCE ALVIN;WILSON ROBERT JOHN
分类号 B32B15/01;G11B5/39;H01F10/32;(IPC1-7):G11B5/39;B32B15/04;B32B15/18 主分类号 B32B15/01
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