| 摘要 |
PROBLEM TO BE SOLVED: To provide a developing processing method which hardly produces pattern deterioration in final drying in developing processing for developing an exposure pattern. SOLUTION: Developing processing is performed by developing processes (ST2 and ST3) for feeding a developer to a resist film after exposure on a substrate W and developing an exposure pattern, a process (ST6) for feeding a water-based washing liquid to the resist film forming the developing pattern, a process (ST7) for feeding a chemical whose surface tension is smaller than water without substantially dissolving a resist on the resist film feeding the water-based washing liquid, and a process (ST8) for rotating and drying the substrate W. |
