发明名称 FORMATION OF COMPOSITE TUNGSTEN FILMS
摘要 Methods for the deposition of tungsten films are provided. The methods include depositing a nucleation layer by alternatively adsorbing a tungsten precursor and a reducing gas on a substrate, and depositing a bulk layer of tungsten over the nucleation layer.
申请公布号 WO03029515(A2) 申请公布日期 2003.04.10
申请号 WO2002US22585 申请日期 2002.07.16
申请人 APPLIED MATERIALS, INC.;LAI, KEN, K.;BYUN, JEONG, SOO;WU, FREDERICK, C.;SRINIVAS, RAMANUJAPURAM, A.;GELATOS, AVGERINOS;CHANG, MEI;KORI, MORIS;SINHA, ASHOK, K.;CHUNG, HUA;FANG, HONGBIN;MAK, ALFRED, W.;YANG, MICHAEL, X.;XI, MING 发明人 LAI, KEN, K.;BYUN, JEONG, SOO;WU, FREDERICK, C.;SRINIVAS, RAMANUJAPURAM, A.;GELATOS, AVGERINOS;CHANG, MEI;KORI, MORIS;SINHA, ASHOK, K.;CHUNG, HUA;FANG, HONGBIN;MAK, ALFRED, W.;YANG, MICHAEL, X.;XI, MING
分类号 C23C16/14;C23C16/02;C23C16/04;C23C16/08;C23C16/44;C23C16/455;H01L21/28;H01L21/285;H01L21/768 主分类号 C23C16/14
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