发明名称 |
Method for measuring the characteristic dimensions of semiconductor structures, whereby generation of measurement step quality parameters allows critical dimension measurements to be improved and rejects reduced |
摘要 |
Method in which the quality of measurement steps is assessed by comparison of a measured value with a stored reference value and a corresponding quality parameter assigned (P1-P4). The parameters are compared with threshold values and if the threshold is exceeded the object is rejected.
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申请公布号 |
DE10147880(A1) |
申请公布日期 |
2003.04.10 |
申请号 |
DE20011047880 |
申请日期 |
2001.09.28 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
BROERMANN, OLIVER;MATTIZA, DIANA;SCHMIDT, SEBASTIAN |
分类号 |
G01N21/956;G03F7/20;(IPC1-7):G01B11/24;G01N21/95;G01B11/30;H01L21/66 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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