| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin film forming method for forming a highly functional thin film, a base material containing such thin film, an optical film containing the base material, and a picture display element having the optical film. SOLUTION: A gas containing a reactive gas and an inert gas is brought between oppositely facing electrodes, under the atmospheric pressure or a pressure nearto, with a high frequency voltage applied. A discharge plasma is thereby generated and, by exposing a base material to the discharge plasma, a thin film is formed on the base material. This thin film forming method is characterized by the maximum temperature on the surface of the base material being 100-400 deg.C during the exposure to the discharge plasma. |
