发明名称 IMAGE FORMATION OPTICAL SYSTEM AND EXPOSURE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an image formation optical system which has the number of apertures with a sufficient size, also satisfactorily undergoes aberration correction, secures a conjugate relation between an incident pupil of an illumination system and an incident pupil of a projection optical system and has an easy configuration, and to provide an exposure device. SOLUTION: The image formation optical system for forming an image of an object arranged on a first surface on a second surface has an incident pupil located at an opposite side from the image formation optical system with respect to the first surface. In this configuration, the second surface side is configured so as to be substantially telecentric. In the image formation optical system, the entire reflection surfaces constituting the image formation optical system are arranged in space from the first surface to the second surface, and the image formation optical system has at least one position conjugate with the first surface in an optical path from the first surface to the second surface.
申请公布号 JP2003107354(A) 申请公布日期 2003.04.09
申请号 JP20010305521 申请日期 2001.10.01
申请人 NIKON CORP 发明人 KOMATSUDA HIDEKI
分类号 G02B17/00;G02B27/18;G03B27/42;G03F7/20;H01L21/027;(IPC1-7):G02B17/00 主分类号 G02B17/00
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