发明名称 |
METHOD FOR MANAGING CONCENTRATION OF PLATING LIQUID FOR MAGNETIC FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for managing a concentration of a plating liquid for magnetic films whereby a Co ion concentration in the plating liquid can be correctly analyzed to enable at least a composition control for an alloy including Fe and Co. SOLUTION: A sample liquid of analyzing the Co ion concentration which is collected from a plating liquid is diluted, and a complexing agent which can be coordinated with Co ions is added to the diluted sample liquid. The concentration of Co ions in the sample liquid is analyzed from an absorbance of a peak wavelength of Co ions in a visible region of light.
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申请公布号 |
JP2003107005(A) |
申请公布日期 |
2003.04.09 |
申请号 |
JP20010302176 |
申请日期 |
2001.09.28 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
ASAI HIROKI |
分类号 |
G01N31/00;C25D7/00;C25D21/12;C25D21/14;G01N21/27;G01N21/78;(IPC1-7):G01N21/78 |
主分类号 |
G01N31/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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